The new Contour node, Toon Material node for cel shading, and Tonemap Pattern shader for half-tone-shading introduce options to create non-photo-real materials in Redshift. In Addition, toon rendering now offers a global contour option that allows line drawing to be easily applied to an entire scene, while users can also define the look of toon lines and toon shading more precisely with contour tone mapping and custom user-authored tone map patterns. With support for Backface contours, artists can easily create retro oscilloscope-type visuals, blueprint styles, and other technical renders where hidden lines have a different color or opacity.